Download e-book for kindle: Advances in CMP Polishing Technologies by Toshiro Doi,Ioan D. Marinescu,Syuhei Kurokawa

By Toshiro Doi,Ioan D. Marinescu,Syuhei Kurokawa

ISBN-10: 0128103566

ISBN-13: 9780128103562

ISBN-10: 1437778593

ISBN-13: 9781437778595

CMP and sharpening are the main certain approaches used to complete the surfaces of mechanical and digital or semiconductor elements. Advances in CMP/Polishing applied sciences for Manufacture of digital units offers the newest advancements and technological techniques within the box – making state of the art R&D obtainable to the broader engineering group.

Most of the purposes of those procedures are saved as personal as attainable (proprietary information), and particular information aren't obvious in expert or technical journals and magazines. This ebook makes those approaches and functions obtainable to a much broader business and educational audience.

Building at the basics of tribology – the technological know-how of friction, put on and lubrication – the authors discover the sensible purposes of CMP and sprucing throughout a variety of industry sectors. as a result excessive velocity of improvement of the electronics and semiconductors undefined, a number of the offered methods and purposes come from those industries.

  • Demystifies medical advancements and technological techniques, beginning them up for brand new functions and technique advancements within the semiconductor and different parts of precision engineering
  • Explores inventory removing mechanisms in CMP and sharpening, and the demanding situations interested by predicting the results of abrasive procedures in high-precision environments
  • The authors compile the most recent techniques and learn from the united states and Japan

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Advances in CMP Polishing Technologies by Toshiro Doi,Ioan D. Marinescu,Syuhei Kurokawa

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